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Characterization of silicon carbide thin films prepared by VHF-PECVD technology

✍ Scribed by S. Zhang; L. Raniero; E. Fortunato; L. Pereira; N. Martins; P. Canhola; I. Ferreira; N. Nedev; H. Águas; R. Martins

No coin nor oath required. For personal study only.

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