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Optical properties of amorphous silicon nitride thin-films prepared by VHF-PECVD using silane and nitrogen

✍ Scribed by Wee Chong Tan; S. Kobayashi; T. Aoki; Robert E. Johanson; S. O. Kasap

Book ID
106397892
Publisher
Springer US
Year
2007
Tongue
English
Weight
340 KB
Volume
20
Category
Article
ISSN
0957-4522

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Silicon nitride (SiN x ) films were prepared by ion-assisted deposition process. The films were analyzed by measurement of scanning electron microscopy (SEM), Fourier transform infrared spectrometry (FTIR), Xray photoelectron spectrometry, spectrophotometer, and ellipsometer measurements. The effect