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Structural and electrical properties of Ni–Cr oxide films prepared by magnetron sputtering

✍ Scribed by N. Saito; I. Nakaaki; H. Iwata; K. Nishioka


Book ID
113937322
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
438 KB
Volume
520
Category
Article
ISSN
0040-6090

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Thin films of ZrO 2 were prepared by reactive magnetron sputtering. Annealing of the films exhibited a drastic change in the properties due to improved crystallinity and packing density. The root mean square roughness of the sample observed from atomic force microscope is about 5.75 nm which is comp