Structural and electrical characterization of microcrystalline silicon films prepared by a layer-by-layer technique with a plasma-enhanced chemical-vapor deposition system

✍ Scribed by Hong, J. P.; Kim, C. O.; Nahm, T. U.; Kim, C. M.

• Book ID: 120454272
• Publisher: American Institute of Physics
• Year: 2000
• Tongue: English
• Weight: 655 KB
• Volume: 87
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.372076