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Structural and electrical characteristics of RF-sputtered HfO2 high-k based MOS capacitors

โœ Scribed by P.M. Tirmali; Anil G. Khairnar; Bhavana N. Joshi; A.M. Mahajan


Book ID
108271863
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
548 KB
Volume
62
Category
Article
ISSN
0038-1101

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