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Investigation of the interface trap density and series resistance of a high- k HfO 2 -based MOS capacitor: before and after 50 MeV Li 3+ ion irradiation

✍ Scribed by Singh, Vikram; Shashank, N.; Kumar, Dinesh; Nahar, Rajender


Book ID
121243100
Publisher
Taylor and Francis Group
Year
2011
Tongue
English
Weight
474 KB
Volume
166
Category
Article
ISSN
1042-0150

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