Hydro-oxygenated carbon (C: H,O) and silicon (Si: H,O) layers are deposited by RF sputtering of graphite and silicon targets in a mixture of argon, hydrogen and oxygen gases.
Structural and chemical analysis of all sputtered a-Si/a-C multilayers
β Scribed by E. Ech-chamikh; M. Azizan; E.L. Ameziane; J.Y. Veuillen; M. Brunel
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 285 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0927-0248
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