Structural and chemical analysis of C : H,O /Si : H,O multilayers deposited by reactive RF sputtering

✍ Scribed by E. Ech-chamikh; M. Azizan; E.L. Ameziane; A. Bennouna; M. Brunel; T.T.A. Nguyen

• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 464 KB
• Volume: 31
• Category: Article
• ISSN: 0927-0248
• DOI: 10.1016/0927-0248(93)90050-d

✦ Synopsis

Hydro-oxygenated carbon (C: H,O) and silicon (Si: H,O) layers are deposited by RF sputtering of graphite and silicon targets in a mixture of argon, hydrogen and oxygen gases.