Structural analysis, elemental profiling, and electrical characterization of HfO2 thin films deposited on In0.53Ga0.47As surfaces by atomic layer deposition

✍ Scribed by Long, R. D.; OConnor, E.; Newcomb, S. B.; Monaghan, S.; Cherkaoui, K.; Casey, P.; Hughes, G.; Thomas, K. K.; Chalvet, F.; Povey, I. M.; Pemble, M. E.; Hurley, P. K.

• Book ID: 111891575
• Publisher: American Institute of Physics
• Year: 2009
• Tongue: English
• Weight: 826 KB
• Volume: 106
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.3243234