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Strippable aqueous base developable negative photoresist for high aspect ratio micromachining

✍ Scribed by Margarita Chatzichristidi; Ioannis Raptis; Constantinos D. Diakoumakos; Nikos Glezos; Panagiotis Argitis; Merope Sanopoulou

No coin nor oath required. For personal study only.

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