𝔖 Bobbio Scriptorium
✦   LIBER   ✦

High aspect ratio micro/nano machining with proton beam writing on aqueous developable – easily stripped negative chemically-amplified resists

✍ Scribed by M. Chatzichristidi; E. Valamontes; P. Argitis; I. Raptis; J.A. van Kan; F. Zhang; F. Watt


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
349 KB
Volume
85
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.