Aqueous base developable: easy stripping, high aspect ratio negative photoresist for optical and proton beam lithography

✍ Scribed by M. Chatzichristidi; I. Rajta; Th. Speliotis; E. Valamontes; D. Goustouridis; P. Argitis; I. Raptis

• Book ID: 106185464
• Publisher: Springer-Verlag
• Year: 2008
• Tongue: English
• Weight: 348 KB
• Volume: 14
• Category: Article
• ISSN: 0946-7076
• DOI: 10.1007/s00542-008-0571-x