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Stress-induced current in nitride and oxidized nitride thin films

โœ Scribed by Mazumder, M.K.; Kobayashi, K.; Mitsuhashi, J.; Koyama, H.


Book ID
114535961
Publisher
IEEE
Year
1994
Tongue
English
Weight
685 KB
Volume
41
Category
Article
ISSN
0018-9383

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Stress gradients in titanium nitride thi
โœ R. Machunze; G.C.A.M. Janssen ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 367 KB

Titanium nitride films, as used for hard coatings, were deposited on silicon wafers by reactive unbalanced magnetron sputtering. For thinner films we find a higher compressive average residual stress than for thicker films. In the paper it is shown that this reduction in average stress is not due to