๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Negative stress-induced current in oxidized nitride layers of different nitride thicknesses (<5 nm)

โœ Scribed by Motaharul Kabir Mazumder; Kiyoteru Kobayashi; Yoji Mashiko; Hiroshi Koyama

Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
578 KB
Volume
39
Category
Article
ISSN
0038-1101

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

A coupled I(V) and charge-pumping analys
A coupled I(V) and charge-pumping analysis of Stress Induced Leakage Currents in 5nm-thick gate oxides
โœ D. Goguenheim; A. Bravaix; D. Vuillaume; F. Mondon; Ph. Candelier; M. Jourdain; ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 301 KB

Stress Induced Leakage Currents (SILC) are studied in 5 nm-thick oxides on both capacitors and N-MOSFETs after homogeneous FOWLER-NORDHEIM injections under high field stress (>9MV/cm) for both polarities and localized Hot-Carrier injections. Standard I(V) and high-frequency C(V) curves are used to m