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Stress in low pressure chemical vapour deposition polycrystalline silicon thin films deposited below 0.1 Torr

✍ Scribed by A. Benitez; J. Bausells; E. Cabruja; J. Esteve; J. Samitier

Book ID: 103959413
Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 588 KB
Volume: 37-38
Category: Article
ISSN: 0924-4247
DOI: 10.1016/0924-4247(93)80122-w

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