𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Stress control in reactively sputtered AlN and TiN films

✍ Scribed by Este, G.


Book ID
127309681
Publisher
AVS (American Vacuum Society)
Year
1987
Tongue
English
Weight
832 KB
Volume
5
Category
Article
ISSN
0734-2101

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Evaluation of impurities in reactive spu
πŸ“‚ Article πŸ“… 1980 πŸ› Elsevier Science 🌐 English βš– 162 KB

Classified abstracts 4523-4531 substrate are minimal. Photoresist images are not degraded, and subsequent lift-off is facilitated., S M Kane and K Y Ahn, J Yuc Sci Tecl~ol, 16 (2). 1979, 171-174.