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Strain relaxation mechanism for hydrogen-implanted Si[sub 1−x]Ge[sub x]/Si(100) heterostructures

✍ Scribed by Trinkaus, H.; Holländer, B.; Rongen, St.; Mantl, S.; Herzog, H.-J.; Kuchenbecker, J.; Hackbarth, T.


Book ID
120358981
Publisher
American Institute of Physics
Year
2000
Tongue
English
Weight
448 KB
Volume
76
Category
Article
ISSN
0003-6951

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