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State of the art of pattern placement accuracy of silicon X-ray master masks

✍ Scribed by S. Pongratz; U. Mescheder; Ch. Ehrlich; H.-L. Huber; K. Kohlmann; W. Windbracke


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
573 KB
Volume
9
Category
Article
ISSN
0167-9317

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