✦ LIBER ✦

Basic study of optical pattern placement accuracy measurement technique in x-ray mask for synchrotron radiation lithography

✍ Scribed by T. Sugihara; T. Arakawa; K. Okada; K. Kodama; H. Izawa

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Study of radiation stability in SiN x-ra

✍ T. Arakawa; T. Sugihara; K. Okada; T. Ueki; Y. Maeda; H. Izawa; T. Matsuo; F. No 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 308 KB