𝔖 Bobbio Scriptorium
✦   LIBER   ✦

SrTiO3–SiO2 oxide films for possible high-k gate dielectric applications

✍ Scribed by Chun-Chieh Lin; Li-Wen Lai; Chih-Yang Lin; Tseung-Yuen Tseng

Book ID
108289377
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
332 KB
Volume
515
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Investigation of strontium tantalate thi
Investigation of strontium tantalate thin films for high-k gate dielectric applications
✍ M. Silinskas; M. Lisker; B. Kalkofen; E.P. Burte 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 456 KB

Strontium tantalate (STO) films were grown by liquid-delivery (LD) metalorganic chemical vapor deposition (MOCVD) using Sr[Ta(OEt) 5 (OC 2 H 4 OMe)] 2 as precursor. The deposition of the films was investigated in dependence on process conditions, such as substrate temperature, pressure, and concentr