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HfAlON films fabricated by pulsed laser ablation for high-k gate dielectric applications

✍ Scribed by J. Zhu; Z.G. Liu; Y.R. Li

Book ID
113788667
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
272 KB
Volume
59
Category
Article
ISSN
0167-577X

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