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Sputtering of the magnetron diode target in the presence of an external ion beam

✍ Scribed by V. V. Zhukov; V. P. Krivobokov; S. N. Yanin

Book ID
111447630
Publisher
Springer
Year
2006
Tongue
English
Weight
194 KB
Volume
51
Category
Article
ISSN
1063-7842

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## Abstract Indium–tin‐oxide (ITO) deposited by conventional capacitive RF magnetron sputtering (rf MS), DC facing target sputtering (dc FTS) and two postannealed samples of these were compared. Comparison of the ITOs aimed at investigating the surface and microstructure effect on the electrical an