The Effect of Ion Current Density on Target Etching in Radio Frequency-Magnetron Sputtering Process

✍ Scribed by Wang, Qing; Wang, Yongfu; Ba, Dechun; Yue, Xiangji

• Book ID: 120333210
• Publisher: IOP Publishing
• Year: 2012
• Tongue: English
• Weight: 587 KB
• Volume: 14
• Category: Article
• ISSN: 1009-0630
• DOI: 10.1088/1009-0630/14/3/09