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The main regularities of the method for producing films by sputtering targets with an ion beam

โœ Scribed by Smirnov, N. N.


Book ID
115400844
Publisher
Optical Society of America
Year
2001
Tongue
English
Weight
27 KB
Volume
68
Category
Article
ISSN
1070-9762

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Beta iron disilicide (b-FeSi 2 ) is one of the candidate materials for a compound semiconductor, which is promising for optoelectronic devices. b-FeSi 2 film has been obtained by ion beam sputter deposition (IBSD) on Si(1 0 0) substrates that are pre-treated by sputter etching by Ne + . In the prese