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Sputtering of Ta2O5 by Ar+ ions at energies below 1 keV

โœ Scribed by H. Oechsner; H. Schoof; E. Stumpe


Book ID
118982177
Publisher
Elsevier Science
Year
1978
Tongue
English
Weight
884 KB
Volume
76
Category
Article
ISSN
0039-6028

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Comparative study of silicon and germani
โœ V.I. Shulga ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 155 KB

Sputtering of amorphous Si and Ge targets by 1-20 keV Ar ions has been studied using the binary-collision simulation. Special attention was given to the angular distribution of sputtered atoms; namely, the energy dependence of the exponent n in the function cos n h approximating the angular distribu