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Sputtering deposition, XPS and X-ray diffraction characterization of hard nitrogen-platinum thin films

✍ Scribed by A. Hecq; J. P. Delrue; M. Hecq; T. Robert

Book ID
104919105
Publisher
Springer
Year
1981
Tongue
English
Weight
399 KB
Volume
16
Category
Article
ISSN
0022-2461

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## Thin (x = 0-30 at.% ) alloy Ðlms prepared by a reactive radio frequency (r.f.) sputtering (Co 0.8 Al 0.2 ) 100-x N x method were characterized by XPS and x-ray di †raction (XRD). The Ðlm with no nitrogen consisted of a CsCltype CoAl metallic compound, while the nitrogen-containing alloys were c