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Sputter power and sputter pressure influenced structural and optical behaviour of RF sputtered nanocrystalline ZnO films

✍ Scribed by R. Subba Reddy; A. Sivasankar Reddy; B. Radhakrishna; S. Uthanna

Book ID: 115554855
Publisher: John Wiley and Sons
Year: 2012
Tongue: English
Weight: 519 KB
Volume: 47
Category: Article
ISSN: 0232-1300
DOI: 10.1002/crat.201200150

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## Abstract Transparent conducting, aluminium doped zinc oxide thin films (ZnO:Al) were deposited by radio frequency (RF) magnetron sputtering. The RF power was varied from 60 to 350 W whereas the substrate temperature was kept at 160 °C. The structural, electrical and optical properties of the as‐