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SPIE Proceedings [SPIE SPIE Optical Metrology 2013 - Munich, Germany (Monday 13 May 2013)] Modeling Aspects in Optical Metrology IV - Characterisation and comparison of ophthalmic instrument quality using a model eye with reverse ray-tracing

✍ Scribed by Sheil, Conor; Goncharov, Alexander V.; Bodermann, Bernd; Frenner, Karsten; Silver, Richard M.

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