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SPIE Proceedings [SPIE Optical Science and Technology, SPIE's 48th Annual Meeting - San Diego, CA (Sunday 3 August 2003)] Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications - Multilayer mirror design for different applications in the XUV using a versatile simulation program

✍ Scribed by Graf, Thomas G.; Michette, Alan G.; Powell, A. Keith; Khounsary, Ali M.; Dinger, Udo; Ota, Kazuya

Book ID: 121509482
Publisher: SPIE
Year: 2004
Weight: 573 KB
Volume: 5193
Category: Article
DOI: 10.1117/12.508791

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