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SPIE Proceedings [SPIE Optical Science and Technology, SPIE's 48th Annual Meeting - San Diego, CA (Sunday 3 August 2003)] Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications - EUV spectral purity filter: optical and mechanical design, grating fabrication, and testing

✍ Scribed by Kierey, Holger; Heidemann, Klaus F.; Kleemann, Bernd H.; Winters, Renate; Egle, Wilhelm J.; Singer, Wolfgang; Melzer, Frank; Wevers, Rutger; Antoni, Martin; Khounsary, Ali M.; Dinger, Udo; Ota, Kazuya

Book ID: 120009352
Publisher: SPIE
Year: 2004
Weight: 585 KB
Volume: 5193
Category: Article
DOI: 10.1117/12.507741

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