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SPIE Proceedings [SPIE Micromachining and Microfabrication - Santa Clara, CA (Monday 18 September 2000)] Micromachining and Microfabrication Process Technology VI - Characterization of deep Si etch profiles formed by atmospheric downstream plasma

✍ Scribed by Bagriy, Igor; Siniaguine, Oleg; Karam, Jean Michel; Yasaitis, John A.

No coin nor oath required. For personal study only.

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