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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Optimized hardware and software for fast full-chip simulation

✍ Scribed by Cao, Yu; Lu, Yen-Wen; Chen, Luoqi; Ye, Jun; Smith, Bruce W.

No coin nor oath required. For personal study only.

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