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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Matching OPC and masks on 300-mm lithography tools utilizing variable illumination settings

✍ Scribed by Palitzsch, Katrin; Kubis, Michael; Schroeder, Uwe P.; Schumacher, Karl; Frangen, Andreas; Smith, Bruce W.

No coin nor oath required. For personal study only.

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