Spectroscopic study of the decomposition process of tetramethylsilane in the N2–H2 and N2–Ar low pressure plasma
✍ Scribed by Jamroz, P.; Zyrnicki, W.
- Book ID
- 123210931
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 630 KB
- Volume
- 14
- Category
- Article
- ISSN
- 0925-9635
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N2O decay has been monitored via infrared emission for a series of mixtures containing N20/Ar and N20/H2/Ar. These mixtures were studied behind reflected shock waves in the temperature interval of 1950-3075' K with total concentrations ranging from 1.2 to 2.5 X 1OI8 molec/cm3. In all cases the N2O d
Emissions at 450 nm and 4.27 ~sm have been measured when a vaxiety of mixtures containing H 2, CO. either 02 or NaO, and Ar were heated behind reflected shock waves to temperatures of 2000-2850 K and total concentrations near 5 x 101| molecule/era 3. These emissions were used to obtain absolute con