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Specific features of amorphous silicon layers grown by plasma-enhanced chemical vapor deposition with tetrafluorosilane

✍ Scribed by J. S. Vainshtein; O. I. Kon’kov; A. V. Kukin; O. S. El’tsina; L. V. Belyakov; E. I. Terukov; O. M. Sreseli

Book ID: 111444894
Publisher: Springer
Year: 2011
Tongue: English
Weight: 142 KB
Volume: 45
Category: Article
ISSN: 1063-7826
DOI: 10.1134/s1063782611030225

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