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Some limitations on electron beam lithography

Book ID
104265288
Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
163 KB
Volume
30
Category
Article
ISSN
0042-207X

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โœฆ Synopsis

by successive masking and etching operations. The optical transmission characteristics of these diffractive filters are analysed and compared with rigorous diffraction theory. (Switzerland)

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We developed a nano-structure fabrication technology over a cylindrical roller using electron beam lithography (EBL) and a specimen rotation apparatus. The high-resolution patterning is done on a cylindrical roller specimen and it is achieved by controlling the thickness of photo-resistance (PR) and