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Space-charge limitations to throughput in projection electron-beam lithography (SCALPEL)

✍ Scribed by J.A. Liddle; M.I. Blakey; C.S. Knurek; M.M. Mkrtchyan; A.E. Novembre; L. Ocola; T. Saunders; W.K. Waskiewicz

No coin nor oath required. For personal study only.

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