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Sodium fluoride thin films by chemical vapor deposition

✍ Scribed by L.J. Lingg; A.D. Berry; A.P. Purdy; K.J. Ewing

Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
874 KB
Volume
209
Category
Article
ISSN
0040-6090

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## Abstract Atmospheric pressure chemical vapor deposition (APCVD) of niobium sulfide coatings was achieved on glass substrates from the reaction of NbCl~5~ and S(SiMe~3~)~2~, __t__Bu~2~S~2~, __t__BuSH, or HSCH~2~CH~2~SH at 250βˆ’600 Β°C. The niobium sulfide films grown at temperatures above 500 Β°C we