The Jormation of amorphous zones in thin heteroepitaxial layers" of silicon has been investigated by optical transmission spectroscopy' with ion species, dose, intensity and irradiation temperature as the main parameters. The dependence of the recrystallization of the irradiated layers on annealing
Site location and optical properties of Eu implanted sapphire
β Scribed by C. Marques; A. Wemans; M.J.P. Maneira; A. Kozanecki; R.C. da Silva; E. Alves
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 201 KB
- Volume
- 240
- Category
- Article
- ISSN
- 0168-583X
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β¦ Synopsis
Synthetic colourless transparent (0 0 0 1) sapphire crystals were implanted at room temperature with 100 keV europium ions to fluences up to 1 β’ 10 16 cm Γ2 . Surface damage is observed at low fluences, as seen by Rutherford backscattering spectrometry under channelling conditions. Optical absorption measurements revealed a variety of structures, most probably related to F-type defects characteristic of implantation damage. Thermal treatments in air or in vacuum up to 1000 Β°C do not produce noticeable changes both in the matrix or the europium profiles. However, the complete recovery of the implantation damage and some redistribution of the europium ions is achieved after annealing at 1300 Β°C in air. Detailed lattice site location studies performed for various axial directions allowed to assess the damage recovery and the incorporation of the Eu ions into well defined crystallographic sites, possibly in an oxide phase also inferred from optical absorption measurements.
π SIMILAR VOLUMES
Sapphire single crystals were implanted at room temperature with 180 keV manganese ions to fluences up to 1.8 β’ 10 17 cm Γ2 . The samples were annealed at 1000 Β°C in oxidizing or reducing atmosphere. Surface damage was observed after implantation of low fluences, the amorphous phase being observed a