Simulation of TaNx deposition by Reactive PVD

✍ Scribed by H. Wolf; R. Streiter; M. Friedemann; P. Belsky; O. Bakaeva; T. Letz; T. Gessner

• Book ID: 104052527
• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 585 KB
• Volume: 87
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2009.11.044

✦ Synopsis

The subject of this paper is the extension of the simulation tool T2 for the application to Reactive Physical Vapor Deposition. The implemented models are briefly described and applied to the deposition of TaN x barriers. The influence of the nitrogen flow and the substrate bias on the deposition rate, the thickness uniformity, and the film composition is discussed.