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Simulation of implantation and diffusion of profiles made with a focused ion-beam implanter

โœ Scribed by Lowther, R.E.; Jacobs, J.B.; Antoniadis, D.A.


Book ID
114595655
Publisher
IEEE
Year
1986
Tongue
English
Weight
432 KB
Volume
33
Category
Article
ISSN
0018-9383

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