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Simulation of fluorocarbon plasma etching of SiO2 structures

✍ Scribed by G. Kokkoris; E. Gogolides; A.G. Boudouvis

Book ID: 114155343
Publisher: Elsevier Science
Year: 2001
Tongue: English
Weight: 224 KB
Volume: 57-58
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(01)00549-4

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