Chemometric analysis of AlξΈSiξΈCu metalli
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Ming-Kaan Liang; Yong-Chien Ling
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Article
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1992
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Elsevier Science
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English
β 919 KB
Al-SI-Cu films deposIted on substrates of SI, borophosphate silicate glass and TiW mth improved electrical properties (lower sheet resistance) and rehatnhty (lugher Al[lll] diffraction mtensity) obtained by the proposed metalbzatlon process are described A chemometrx approach of umfymg the expernnen