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Simple model of power deposited into the plasma bulk of rf planar magnetrons

✍ Scribed by Minea, T M; Bretagne, J


Book ID
121497418
Publisher
Institute of Physics
Year
2003
Tongue
English
Weight
154 KB
Volume
12
Category
Article
ISSN
0963-0252

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πŸ“œ SIMILAR VOLUMES


The dependence of deposition rate on pow
✍ AR Nyaiesh; L Holland πŸ“‚ Article πŸ“… 1981 πŸ› Elsevier Science 🌐 English βš– 264 KB

An earlier study of the magnetron sputtering of copper in this laboratory has shown that the growth rate in Ar for a dc magnetron is almost twice that for an rf system with an identical target, operated at the same indicated power input. Experiments have been made to find whether the difference in t