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Effect of rf-power density on the resistivity of Ga-doped ZnO film deposited by rf-magnetron sputter deposition technique

✍ Scribed by Jun Kwan Kim; Sun Jin Yun; Jae Min Lee; Jung Wook Lim


Book ID
108079327
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
525 KB
Volume
10
Category
Article
ISSN
1567-1739

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## Abstract Influences of O~2~/Ar flux ratio (__R__) on surface morphology and structural evolution have been studied in the case of ZnO films deposited on glass substrates by radio‐frequency (rf) magnetron sputtering. Results of atomic force microscopy (AFM), X‐ray diffraction, and X‐ray photoelec