Silicon wafer cleaning with CF4/H2 plasma and its effect on the properties of dry thermally grown oxide

✍ Scribed by R.K. Chanana; R. Dwivedi; S.K. Srivastava

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 454 KB
• Volume: 35
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(92)90076-o