Silicon wafer cleaning with CF4/H2 plasma and its effect on the properties of dry thermally grown oxide : R. K. Chanana, R. Dwivedi and S. K. Srivastava. Solid-State Electronics35(10), 1417 (1992)

• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 110 KB
• Volume: 33
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(93)90216-l