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Silicon nitride films deposited from SiF4/NH3gas mixtures

✍ Scribed by C. Gomez-Aleixandre; O. Sanch Ez-Garrido; J. M. Martinez-Duart; J. M. Albella

Book ID
104838328
Publisher
Springer
Year
1991
Tongue
English
Weight
387 KB
Volume
26
Category
Article
ISSN
0022-2461

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Temperature effect on charge density of
Temperature effect on charge density of silicon nitride films deposited in SiH4–NH3–N2 plasma
✍ Byungwhan Kim; Sang Hee Kwon πŸ“‚ Article πŸ“… 2008 πŸ› Elsevier Science 🌐 English βš– 592 KB

Improved surface passivation of silicon nitride films requires a high positive charge density. A neural network model of SiN charge density was used to investigate temperature effects on charge density. For a systematic modeling, the deposition process was characterized by means of a face-centered B