Modelling of silicon nitride deposition by 254 nm Hg-photosensitization and 185 nm photolysis of SiH4/NH3 gas mixture

✍ Scribed by Bruno Allain; Jérôme Perrin; Jean Luc Guizot

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 369 KB
• Volume: 36
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/0169-4332(89)90915-x