๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Silicon coatings on copper by chemical vapor deposition in fluidized bed reactors

โœ Scribed by A. Sanjurjo; B.J. Wood; K.H. Lau; G.T. Tong; D.K. Choi; M.C.H. McKubre; H.K. Song; D. Peters; N. Church

Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
695 KB
Volume
49
Category
Article
ISSN
0257-8972

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Silicon Chemical Vapor Deposition on mac
Silicon Chemical Vapor Deposition on macro and submicron powders in a fluidized bed
โœ L. Cadoret; N. Reuge; S. Pannala; M. Syamlal; C. Rossignol; J. Dexpert-Ghys; C. ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 837 KB

Titanium oxide (TiO 2 ) submicron powders have been treated by Chemical Vapor Deposition (CVD) in a vibrofluidized bed in order to deposit silicon layers of nanometer scale on each individual grain from silane (SiH 4 ). Experimental results show that for the conditions tested, the original granular

Silicon oxynitride gas barrier coatings
Silicon oxynitride gas barrier coatings on poly(ether sulfone) by plasma-enhanced chemical vapor deposition
โœ Juno Shim; Ho Gyu Yoon; Sang-Hyun Na; Insun Kim; Soonjong Kwak ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 567 KB

Thin silicon oxynitride (SiO x N y ) has been deposited for a gas barrier layer on the surface of poly(ether sulfone) film using plasma-enhanced chemical vapor deposition (PECVD) of a mixture of hexamethyldisiloxane (HMDSO) and ammonia. The chemical structure of the deposited layer varied from organ